Home

Bermad zuur kompas hard mask materials Verniel vaardigheid Krijt

Si Hardmask (Si-HM), EUV And Zero Defects
Si Hardmask (Si-HM), EUV And Zero Defects

New silicon hard mask material development for sub-5nm node
New silicon hard mask material development for sub-5nm node

Spin-on Dual Hard Mask Material | JSR Micro, Inc.
Spin-on Dual Hard Mask Material | JSR Micro, Inc.

Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar

PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar
PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar

Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer | ACS Nano
Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer | ACS Nano

SPIE 2021 – Applied Materials – DRAM Scaling - SemiWiki
SPIE 2021 – Applied Materials – DRAM Scaling - SemiWiki

Improvement of high resolution lithography by using amorphous carbon hard mask - ScienceDirect
Improvement of high resolution lithography by using amorphous carbon hard mask - ScienceDirect

PDF) Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology
PDF) Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology

BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling

Materials | Free Full-Text | A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm
Materials | Free Full-Text | A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm

Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)

Microwaves101 | Photolithography 101
Microwaves101 | Photolithography 101

Semiconductor Process Materials|Semiconductor material: etc
Semiconductor Process Materials|Semiconductor material: etc

Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering
Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering

KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents
KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents

Etching characteristics of TiN used as hard mask in dielectric etch process: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena: Vol 24, No 5
Etching characteristics of TiN used as hard mask in dielectric etch process: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena: Vol 24, No 5

Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar

Hard Mask Fabrication (HMF) - NanoSearcher
Hard Mask Fabrication (HMF) - NanoSearcher

Simplified process flow illustrating (a) "via-first" and (b)... | Download Scientific Diagram
Simplified process flow illustrating (a) "via-first" and (b)... | Download Scientific Diagram

PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins
PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins

The micropatterns (first figure) can be achieved by | Chegg.com
The micropatterns (first figure) can be achieved by | Chegg.com

Alpha Carbon Hardmask in 3D-NAND Device Manufacturing Characterization by Multiple Metrology Methods for In-Line Control of High Aspect Ratio Etching - Onto Innovation
Alpha Carbon Hardmask in 3D-NAND Device Manufacturing Characterization by Multiple Metrology Methods for In-Line Control of High Aspect Ratio Etching - Onto Innovation

Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing | SpringerLink
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing | SpringerLink

NIL_vs_NEP-768x604.png
NIL_vs_NEP-768x604.png

Analytics for US Patent No. 6472107, Disposable hard mask for photomask plasma etching
Analytics for US Patent No. 6472107, Disposable hard mask for photomask plasma etching

Amorphous Carbon Hard Mask for Multiple Patterning Lithography | Semantic Scholar
Amorphous Carbon Hard Mask for Multiple Patterning Lithography | Semantic Scholar

BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling

Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar

Etching with a hard mask - Plasma Etching - Texas Powerful Smart
Etching with a hard mask - Plasma Etching - Texas Powerful Smart